EUV processes

Since the material and the short wavelengths of EUV and soft X-ray radiation interact so strongly, research has opened up new analysis and structuring processes in compact systems on the nanometer scale. Fraunhofer ILT has developed demonstrators for various applications, e.g. to conduct X-ray microscopy, reflectometry to analyze surface layer systems or interference lithography to generate nanostructures. The basic research on these studies is carried out in cooperation with the RWTH Aachen University within the group of Experimental Physics of Extreme Ultraviolet (EUV) and the Chair for Technology of Optical Systems (TOS).